Acid diffusion through polymer films

被引：16

作者：

Zhang, PL ^{[1
]}

Eckert, AR ^{[1
]}

Willson, CG ^{[1
]}

Webber, SE ^{[1
]}

机构：

[1] UNIV TEXAS,DEPT CHEM,AUSTIN,TX 78712

来源：

ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIV | 1997年 / 3049卷

关键词：

fluorescence; pH sensor; diffusion; diffusion constant; thin film;

D O I：

10.1117/12.275903

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In order to perform 0.2 mu m processes, one needs to study the diffusion of photoacid generators within the photoresist system, since diffusion during post exposure bake time has an influence on the critical dimension (CD). We have developed a new method is based on monitoring the change of the fluorescence intensity of a pH-sensitive fluorescent dye caused by the reaction with photoacid.

引用

页码：898 / 909

页数：12