A high-Q tunable micromechanical capacitor with movable dielectric for RF applications

被引:53
作者
Yoon, JB [1 ]
Nguyen, CTC [1 ]
机构
[1] Univ Michigan, Dept EECS, Ctr Integrated Microsyst, Ann Arbor, MI 48109 USA
来源
INTERNATIONAL ELECTRON DEVICES MEETING 2000, TECHNICAL DIGEST | 2000年
关键词
D O I
10.1109/IEDM.2000.904362
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A high-Q, tunable, micromechanical capacitor has been realized using an IC-compatible, electroplated-metal surface micromachining technology and demonstrated with quality (Q-) factors in excess of 290 -the highest reported to date for on-chip tunable capacitors at frequencies near 1 GHz. The key feature in this design that makes possible such high on-chip Q is the method for capacitive tuning, which in this design is based on moving the dielectric between the capacitor plates, rather than moving the plates themselves, as done in previous designs. One version of this design achieves a measured Q of 291 at 1 GHz (C=1.21pF) with a tuning range of 7.7% over 10V of control voltage, and an expected self-resonant frequency (SRF) of 19GHz. In another design, with a wider tuning range of 40% over 10V, a Q of 218 is achieved at 1 GHz (C=1.14pF).
引用
收藏
页码:489 / 492
页数:4
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