Photocatalytic activity of nanostructured TiO2 thin films prepared by dc magnetron sputtering method

被引：100

作者：

Zheng, SK ^{[1
]}

Wang, TM ^{[1
]}

Xiang, G ^{[1
]}

Wang, C ^{[1
]}

机构：

[1] Beijing Univ Aeronaut & Astronaut, Ctr Mat Phys & Chem, Sch Sci, Beijing 100083, Peoples R China

来源：

VACUUM | 2001年 / 62卷 / 04期

基金：

中国国家自然科学基金;

关键词：

TiO2 thin film; photocatalytic activity; dc magnetron sputtering; nanostructured;

D O I：

10.1016/S0042-207X(01)00353-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Transparent and colourless nanostructured titanium dioxide thin films have been fabricated on microscope glass slides by the de magnetron reactive sputtering method using Ar and O-2 as working gases. X-ray diffraction (XRD), Xray photoelectron spectroscopy (XPS) and UV-Vis-NIR spectrophotometer technologies were used to characterize the films. The stoichiometric TiO2 thin films with anatase phase were obtained by optimizing the sputtering parameters such as sputtering gas Ar:O-2 ratio, sputtering gas pressure and sputtering power. The photocatalytic activity of the samples was tested on the degradation of Rhodamine B(Rh.B) dye. The relatively better degradation efficiency compared with Rh.B mineralization was obtained in the sample annealed at 500 degreesC. (C) 2001 Elsevier Science Ltd. All rights reserved.

引用

页码：361 / 366

页数：6

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