In situ synchrotron studies of ZnO nanostructures during electrochemical deposition

被引:11
作者
Ingham, Bridget [1 ,2 ]
Illy, Benoit N. [3 ,4 ]
Ryan, Mary P. [3 ,4 ]
机构
[1] Ind Res Ltd, Lower Hutt, New Zealand
[2] Stanford Synchrotron Radiat Lab, Menlo Pk, CA 94025 USA
[3] Univ London Imperial Coll Sci Technol & Med, Dept Mat, London SW7 2AZ, England
[4] Univ London Imperial Coll Sci Technol & Med, London Ctr Nanotechnol, London SW7 2AZ, England
关键词
electrochemical synthesis; nanostructures; ZnO; XANES; synchrotron techniques;
D O I
10.1016/j.cap.2007.10.038
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
ZnO nanostructured films fabricated by electrochemical deposition exhibit a variety of morphologies. Understanding their respective nucleation and growth mechanisms requires in situ techniques. A time-resolved X-ray absorption and fluorescence method is described, which adequately captures both processes and illustrates differences in the growth rates for films deposited at different potentials. In so doing, the new method has significant advantages over a previous method of continually scanning across the near-edge region of the absorption spectrum while the film was being deposited. (C) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:455 / 458
页数:4
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