Effect of O2 pressure on the preferred orientation of TiO2 films prepared by filtered arc deposition

Titanium oxide films were prepared by filtered are deposition, where a beam of titanium ions was generated by a filtered are evaporation source and reacted with O-2 in the vacuum chamber. A negative substrate bias of 400 V was added during film growth. The films were investigated by Fourier transform infrared spectroscopy (FT-IR) and X-ray diffraction (XRD) methods. A IR absorption peak at about 500 cm(-1) was observed which is attributed to Ti-O bonds in a six-fold environment. A change from (002) to (101) preferred orientation of cm titanium oxide films with rutile type structure was observed with increasing O-2 prlssure from 4 x 10(-2) to 2 x 10(-1) Pa. The effect of O-2 pressure on the preferred orientation was discussed. (C) 1998 Elsevier Science S.A. All rights reserved.