共 5 条
[1]
Growth of microcrystalline silicon film by electron beam excited plasma chemical vapor deposition without hydrogen dilution
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1998, 16 (05)
:3134-3137
[2]
KUBOTA T, 1999, ED9928 IEICE, P7
[3]
NINOMIYA Y, 1999, REPORT HIGH TECH RES, P148
[4]
TAODA H, 1995, P 5 INT S NEW GLASS, P143
[5]
Uramoto J., 1983, Journal of the Vacuum Society of Japan, V26, P15, DOI 10.3131/jvsj.26.15