Discharge comparison of nonequilibrium atmospheric pressure Ar/O2 and He/O2 plasma jets

被引:126
作者
Wang, S [1 ]
Schulz-von der Gathen, V
Döbele, HF
机构
[1] Univ Essen Gesamthsch, Inst Laser & Plasmaphys, D-45117 Essen, Germany
[2] Chinese Acad Sci, Microelect R&D Ctr, Beijing 100010, Peoples R China
关键词
D O I
10.1063/1.1615674
中图分类号
O59 [应用物理学];
学科分类号
摘要
A plasma jet has been developed that operates using rf power and produces a stable homogeneous discharge at atmospheric pressure. Discharge characteristics for the gas mixture of He/O-2 and Ar/O-2 were studied. The temperature distribution at the exit of the nozzle of Ar/O-2 discharge is about 100 K higher than that for the He/O-2 discharge-identified by an increased temperature-extends much farther downstream for Ar/O-2 discharge in contrast to the He/O-2 discharge-250 mm as compared to 75 mm. Optical emission spectra for both discharges in the jet effluent shows only fractions of the peak intensities of Ar, He, and O atomic lines compared with spectra taken looking obliquely inside the jet volume. The spatial profile of excited atomic oxygen at lambda=777 nm (S-4(0) 3p-3s) taken side on to the flow direction outside the nozzle shows good correlation to the temperature distribution for both discharges. These results indicate that the Ar/O-2 discharge has better energy transfer efficiency than the He/O-2 discharge. Study of the electrical properties of the two discharges shows that the two discharges exhibit a different capacitive nature and the voltage wave form for He/O-2 advances that of the Ar/O-2 discharge by 16degrees, which means there is more ohmic component in the Ar/O-2 discharge. (C) 2003 American Institute of Physics.
引用
收藏
页码:3272 / 3274
页数:3
相关论文
共 14 条
[1]   Deposition of silicon dioxide films with a non-equilibrium atmospheric-pressure plasma jet [J].
Babayan, SE ;
Jeong, JY ;
Schütze, A ;
Tu, VJ ;
Moravej, M ;
Selwyn, GS ;
Hicks, RF .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2001, 10 (04) :573-578
[2]   UV EXCIMER RADIATION FROM DIELECTRIC-BARRIER DISCHARGES [J].
ELIASSON, B ;
KOGELSCHATZ, U .
APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY, 1988, 46 (04) :299-303
[3]   Decontamination of chemical and biological warfare, (CBW) agents using an atmospheric pressure plasma jet (APPJ) [J].
Herrmann, HW ;
Henins, I ;
Park, J ;
Selwyn, GS .
PHYSICS OF PLASMAS, 1999, 6 (05) :2284-2289
[4]   Etching materials with an atmospheric-pressure plasma jet [J].
Jeong, JY ;
Babayan, SE ;
Tu, VJ ;
Park, J ;
Henins, I ;
Hicks, RF ;
Selwyn, GS .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1998, 7 (03) :282-285
[5]   Reaction chemistry in the afterglow of an oxygen-helium, atmospheric-pressure plasma [J].
Jeong, JY ;
Park, J ;
Henins, I ;
Babayan, SE ;
Tu, VJ ;
Selwyn, GS ;
Ding, G ;
Hicks, RF .
JOURNAL OF PHYSICAL CHEMISTRY A, 2000, 104 (34) :8027-8032
[6]   Experimental and theoretical study of a glow discharge at atmospheric pressure controlled by dielectric barrier [J].
Massines, F ;
Rabehi, A ;
Decomps, P ;
Gadri, RB ;
Segur, P ;
Mayoux, C .
JOURNAL OF APPLIED PHYSICS, 1998, 83 (06) :2950-2957
[7]   Multitube surface-wave discharges for increased gas throughput at atmospheric pressure [J].
Moisan, M ;
Zakrzewski, Z ;
Etemadi, R ;
Rostaing, JC .
JOURNAL OF APPLIED PHYSICS, 1998, 83 (11) :5691-5701
[8]   Remote plasma-enhanced chemical vapour deposition of silicon nitride at atmospheric pressure [J].
Nowling, GR ;
Babayan, SE ;
Jankovic, V ;
Hicks, RF .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2002, 11 (01) :97-103
[9]   An atmospheric pressure plasma source [J].
Park, J ;
Henins, I ;
Herrmann, HW ;
Selwyn, GS ;
Jeong, JY ;
Hicks, RF ;
Shim, D ;
Chang, CS .
APPLIED PHYSICS LETTERS, 2000, 76 (03) :288-290
[10]   Discharge phenomena of an atmospheric pressure radio-frequency capacitive plasma source [J].
Park, J ;
Henins, I ;
Herrmann, HW ;
Selwyn, GS ;
Hicks, RF .
JOURNAL OF APPLIED PHYSICS, 2001, 89 (01) :20-28