A fully synchronized, pipelined, and re-configurable 50Mb SRAM on 90nm CMOS technology for logic applications

被引:14
作者
Zhang, K [1 ]
Bhattacharya, U [1 ]
Ma, L [1 ]
Ng, Y [1 ]
Zheng, B [1 ]
Bohr, M [1 ]
Thompson, S [1 ]
机构
[1] Intel Corp, Portland Technol Dev, Hillsboro, OR 97124 USA
来源
2003 SYMPOSIUM ON VLSI CIRCUITS, DIGEST OF TECHNICAL PAPERS | 2003年
关键词
D O I
10.1109/VLSIC.2003.1221219
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
A 50Mb SRAM chip is designed and fabricated on an industry leading 90nm CMOS technology that features a 1um(2) SRAM cell and 50nm gate length transistors with strained silicon[1]. The SRAM chip is formed with 100x512Kb subarrays that have 2.5 GHz nominal operating frequency, 75% area efficiency, and fully synchronized internal timing along with efficient local power-down feature. And the design can be easily re-configured to form large high-density on-die cache memory for high-speed logic applications such as CPUs.
引用
收藏
页码:253 / 254
页数:2
相关论文
共 3 条
[1]   STATIC-NOISE MARGIN ANALYSIS OF MOS SRAM CELLS [J].
SEEVINCK, E ;
LIST, FJ ;
LOHSTROH, J .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1987, 22 (05) :748-754
[2]  
THOMPSON S, 2002, IEDM DEC
[3]   The scaling of data sensing schemes for high speed cache design in sub-0.18μm technologies [J].
Zhang, K ;
Hose, K ;
De, V ;
Senyk, B .
2000 SYMPOSIUM ON VLSI CIRCUITS, DIGEST OF TECHNICAL PAPERS, 2000, :226-227