New photolabile protecting groups in nucleoside and nucleotide chemistry -: Synthesis, cleavage mechanisms and applications

被引：48

作者：

Giegrich, H ^{[1
]}

Eisele-Bühler, S ^{[1
]}

Hermann, C ^{[1
]}

Kvasyuk, E ^{[1
]}

Charubala, R ^{[1
]}

Pfleiderer, W ^{[1
]}

机构：

[1] Univ Konstanz, Fak Chem, D-78434 Constance, Germany

来源：

NUCLEOSIDES & NUCLEOTIDES | 1998年 / 17卷 / 9-11期

关键词：

D O I：

10.1080/07328319808004738

中图分类号：

Q5 [生物化学]; Q7 [分子生物学];

学科分类号：

071010 ; 081704 ;

摘要：

New photolabile protecting groups have been found in the 2-(2-nitrophenyl)ethoxycarbonyl and the 2-(2-nitrophenyl)ethylsulfonyl group, respectively. The influence of substituents at the phenyl ring as well as the side-chain has been investigated regarding the photolysis rates on irradiation at 365 mn. beta-Branching in the side-chain leads to highly increased rates of photodeprotection. A new type of photocleavage mechanism consisting of a photoinduced beta-elimination process is proposed.

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页码：1987 / 1996

页数：10

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