Anodic thin films on titanium used as masks for surface micropatterning of biomedical devices

被引:28
作者
Jaeggi, C
Kern, P
Michler, J
Zehnder, T
Siegenthaler, H
机构
[1] EMPA Mat Sci & Technol, CH-3602 Thun, Switzerland
[2] Ion Beam Anal Ctr, CH-2400 Le Locle, Switzerland
[3] Univ Bern, Dept Chem & Biochem, CH-3012 Bern, Switzerland
关键词
titanium oxide; anodizing; impedance spectroscopy; laser; ion implantation; surface micropatterning;
D O I
10.1016/j.surfcoat.2005.08.021
中图分类号
TB3 [工程材料学];
学科分类号
0805 [材料科学与工程]; 080502 [材料学];
摘要
Ceramic oxide films like TiO2 are used on medical implants to improve biocompatibility and corrosion behavior. Along with the chemical composition, the topography of implants with surface features in the tens of microns range is known to promote osteointegration. In this work, the prospective of anodically gown TiO2 thin films as mask material for subsequent electrochemical micro/nanopatterning of medical implant surfaces sensitized by He-ion beam and YAG-laser irradiation is investigated. Electrochemical impedance spectroscopy was used to characterize resistance and capacitance of oxide films anodized under various conditions. The resistance obtained by fitting to an appropriate equivalent circuit was compared to the film stability in electrochemical pitting experiments. Film thickness, composition and microstructure were analyzed by glow discharge optical emission spectroscopy (GDOES), Xray photoelectron spectroscopy, scanning and transmission electron microscopy and Raman spectroscopy. An increasing film resistance of the porous part of the oxide was found to correlate to increasing pitting resistance. GDOES revealed a low carbon and sulfur concentration in the film as well as an accumulation of hydrogen at the oxide/metal interface. Based on the performance in pitting tests, suitable anatase TiO2 films were used for laser micropatterning, and thinner mainly amorphous films were used for He-ion beam micropatterning experiments. YAG-laser treatment led to preferential dissolution of the irradiated sites during the subsequent etching step. Both preferential and reduced dissolution was observed in case of He-ion implantation. Potential physico-chemical mechanisms for observed micropatteming effects are discussed. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:1913 / 1919
页数:7
相关论文
共 27 条
[1]
Dielectric properties of TiO2-films reactively sputtered from Ti in an RF magnetron [J].
Alexandrov, P ;
Koprinarova, J ;
Todorov, D .
VACUUM, 1996, 47 (11) :1333-1336
[2]
Oxides formed on titanium by polishing, etching, anodizing, or thermal oxidizing [J].
Birch, JR ;
Burleigh, TD .
CORROSION, 2000, 56 (12) :1233-1241
[3]
OPTICAL INDEXES OF OXIDE-FILMS AS A FUNCTION OF THEIR CRYSTALLIZATION - APPLICATION TO ANODIC TIO2 (ANATASE) [J].
BLONDEAU, G ;
FROELICHER, M ;
FROMENT, M ;
HUGOTLEGOFF, A .
THIN SOLID FILMS, 1977, 42 (02) :147-153
[4]
INFLUENCE OF SURFACE CHARACTERISTICS ON BONE INTEGRATION OF TITANIUM IMPLANTS - A HISTOMORPHOMETRIC STUDY IN MINIATURE PIGS [J].
BUSER, D ;
SCHENK, RK ;
STEINEMANN, S ;
FIORELLINI, JP ;
FOX, CH ;
STICH, H .
JOURNAL OF BIOMEDICAL MATERIALS RESEARCH, 1991, 25 (07) :889-902
[5]
Applications of laser lithography on oxide film to titanium micromachining [J].
Chauvy, PF ;
Hoffmann, P ;
Landolt, D .
APPLIED SURFACE SCIENCE, 2003, 208 :165-170
[6]
Crystallization of anodic titania on titanium and its alloys [J].
Habazaki, H ;
Uozumi, M ;
Konno, H ;
Shimizu, K ;
Skeldon, P ;
Thompson, GE .
CORROSION SCIENCE, 2003, 45 (09) :2063-2073
[7]
Formulation for XPS spectral change of oxides by ion bombardment as a function of sputtering time [J].
Hashimoto, S ;
Tanaka, A ;
Murata, A ;
Sakurada, T .
SURFACE SCIENCE, 2004, 556 (01) :22-32
[8]
JOHNSON PB, 1991, NATO ADV SCI I B-PHY, V279, P167
[9]
DIELECTRIC-PROPERTIES OF ANODIC OXIDE-FILMS ON TANTALUM [J].
KERREC, O ;
DEVILLIERS, D ;
GROULT, H ;
CHEMLA, M .
ELECTROCHIMICA ACTA, 1995, 40 (06) :719-724
[10]
Electrochemical micromachining, polishing and surface structuring of metals: fundamental aspects and new developments [J].
Landolt, D ;
Chauvy, PF ;
Zinger, O .
ELECTROCHIMICA ACTA, 2003, 48 (20-22) :3185-3201