New method of vapour discrimination using the Thickness Shear Mode (TSM) resonator

被引：6

作者：

Holloway, AF ^{[1
]}

Nabok, A ^{[1
]}

Thompson, M ^{[1
]}

Ray, AK ^{[1
]}

Crowther, D ^{[1
]}

Siddiqi, J ^{[1
]}

机构：

[1] Sheffield Hallam Univ, Sch Engn, Nanotechnol Res Labs, Sheffield S1 1WB, S Yorkshire, England

来源：

SENSORS | 2003年 / 3卷 / 06期

关键词：

impedance analysis; QCM; TSM resonator; BVD model; FILMS;

D O I：

10.3390/s30600187

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

The Impedance analysis technique complemented with curve fitting software was used to monitor changes in film properties of Thickness Shear Mode (TSM) resonator on vapour exposure. The approach demonstrates how sensor selectivity can be achieved through unique changes in film viscosity caused by organic vapour adsorption.

引用

页码：187 / 191

页数：5

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