Comment on "Unraveling the conduction mechanism of Al-doped ZnO films by valence band soft x-ray photoemission spectroscopy" [Appl. Phys. Lett. 86, 042104 (2005)]

被引:3
作者
Lin, YJ [1 ]
机构
[1] Natl Changhua Univ Educ, Inst Photon, Changhua 500, Taiwan
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D O I
10.1063/1.1935759
中图分类号
O59 [应用物理学];
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页数:1
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[1]   Unraveling the conduction mechanism of Al-doped ZnO films by valence band soft x-ray photoemission spectroscopy -: art. no. 042104 [J].
Gabás, M ;
Gota, S ;
Ramos-Barrado, JR ;
Sánchez, M ;
Barrett, NT ;
Avila, J ;
Sacchi, M .
APPLIED PHYSICS LETTERS, 2005, 86 (04) :042104-1
[2]   ZnO:Al thin films obtained by chemical spray:: effect of the Al concentration [J].
Mondragón-Suárez, H ;
Maldonado, A ;
Olvera, MDL ;
Reyes, A ;
Castanedo-Pérez, R ;
Torres-Delgado, G ;
Asomoza, R .
APPLIED SURFACE SCIENCE, 2002, 193 (1-4) :52-59