Electron-induced secondary electron emission yield from condensed rare gases: Ne, Ar, Kr, and Xe

被引:19
作者
Cazaux, J
Bozhko, Y
Hilleret, N
机构
[1] Fac Sci, Lab Anal Solides Surfaces & Interfaces, F-51687 Reims 2, France
[2] Ctr Etud & Rech Nucl, CH-1211 Geneva 23, Switzerland
[3] Deutsch Elektronen Synchrotron MKS Div, D-22607 Hamburg, Germany
关键词
D O I
10.1103/PhysRevB.71.035419
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The secondary electron emission (SEE) yield delta has been measured for condensed layers of Ne, Ar, Kr, and Xe excited by primary electrons of energy E-0 ranging from 0.05 up to 3 keV. The deposited thickness D ranges from 0 up to a few thousands of monolayers. For very thick specimens, the evolution of the delta(E-0) curves is very similar for all the four gases and it may be described by a single analytical expression. At 3 keV, the maximum yield is not attained for the thickest layers despite the fact that the measured yields exceed several tens. These observed high yields are analyzed in terms of escape depth for secondary electrons (similar to the micrometer range) and of escape probability (>75%). Such results are consistent with those previously obtained by proton bombardment and by x-ray photon irradiation. More surprising is the observed increase of delta with D when all the primary electrons remain confined in the film, D>R (range of incident electrons), and several hypotheses are suggested to explain this effect: increase of the crystallite grain size, charging mechanism, SE reflection effects at the film/solid interface. For very thin films where the constant thickness D is D<R, the observed decrease of delta as a function of E-0 is qualitatively explained but, when D is changed, additional calculations are needed.
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页数:12
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共 23 条
[1]   Fast proton-induced electron emission from rare-gas solids and electrostatic charging effects [J].
Baragiola, RA ;
Shi, M ;
Vidal, RA ;
Dukes, CA .
PHYSICAL REVIEW B, 1998, 58 (19) :13212-13218
[2]  
Bronshtein I M., 1969, Secondary Electron Emission
[3]   INFLUENCE OF VARIOUS VACUUM SURFACE TREATMENTS ON THE SECONDARY-ELECTRON YIELD OF NIOBIUM [J].
CALDER, R ;
DOMINICHINI, G ;
HILLERET, N .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1986, 13 (1-3) :631-636
[4]   Some considerations on the secondary electron emission, δ, from e- irradiated insulators [J].
Cazaux, J .
JOURNAL OF APPLIED PHYSICS, 1999, 85 (02) :1137-1147
[5]   A random walk model for the crystallite size effect on the secondary electron yield from insulators [J].
Cazaux, J .
THIN SOLID FILMS, 2003, 434 (1-2) :303-310
[6]   A new analytical approach for the transport and the emission yield of secondary electrons from insulators [J].
Cazaux, J .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2002, 192 (04) :381-392
[7]   Correlation between the x-ray induced and the electron-induced electron emission yields of insulators [J].
Cazaux, J .
JOURNAL OF APPLIED PHYSICS, 2001, 89 (12) :8265-8272
[8]  
Danilatos GD, 1988, FDN ENV SCANNING ELE
[9]  
DEKKER AJ, 1958, SOLID STATE PHYS, V6, P251
[10]   Inelastic scattering of electrons at real metal surfaces [J].
Ding, ZJ .
PHYSICAL REVIEW B, 1997, 55 (15) :9999-10013