Dielectric constant boost in amorphous sesquioxides

被引:14
作者
Delugas, Pietro [1 ,2 ]
Fiorentini, Vincenzo [1 ,3 ,4 ]
Filippetti, Alessio [3 ,4 ]
机构
[1] NXP Semicond, B-3001 Louvain, Belgium
[2] CNR, IMM, I-95123 Cagliari, Italy
[3] CNR, INFM, SLACS, I-09100 Cagliari, Italy
[4] Univ Cagliari, Dipartimento Fis, I-09042 Sardinia, Italy
关键词
D O I
10.1063/1.2917797
中图分类号
O59 [应用物理学];
学科分类号
摘要
High-kappa dielectrics for insulating layers are a current key ingredient of microelectronics. X2O3 sesquioxide compounds are among the candidates. Here, we show for a typical material of this class, Sc2O3, that the relatively modest dielectric constant of its crystalline phase is enhanced in the amorphous phase by over 40% (from similar to 15 to similar to 22). This is due to the disorder-induced activation of low frequency cation-related modes which are inactive or inefficient in the crystal and by the conservation of effective dynamical charges (a measure of atomic polarizability). The analysis employs density-functional energy-force and perturbation-theory calculations of the dielectric response of amorphous samples generated by pair-potential molecular dynamics. (C) 2008 American Institute of Physics.
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页数:3
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