Negative ions: The overlooked species in thin film growth by pulsed laser deposition

被引：20

作者：

Esposito, M. ^{[1
]}

Bator, M. ^{[1
]}

Doebeli, M. ^{[2
]}

Lippert, T. ^{[1
]}

Schneider, C. W. ^{[1
]}

Wokaun, A. ^{[1
]}

机构：

[1] Paul Scherrer Inst, Gen Energy Res Dept, CH-5232 Villigen, Switzerland

[2] ETH, Ion Beam Phys, CH-8093 Zurich, Switzerland

来源：

APPLIED PHYSICS LETTERS | 2011年 / 99卷 / 19期

基金：

瑞士国家科学基金会;

关键词：

ABLATION;

D O I：

10.1063/1.3660399

中图分类号：

O59 [应用物理学];

学科分类号：

070305 [高分子化学与物理];

摘要：

Plasma plume species from a ceramic La0.4Ca0.6MnO3 target were studied by plasma mass spectrometry as a function of laser fluence, background gas, and deposition pressure to understand the interplay between plasma composition and oxide thin film growth by pulsed laser deposition. The plume composition reveals a significant contribution of up to 24% of negative ions, most notably using a N2O background. The significance of negative ions for thin film growth is shown for La0.4Ca0.6MnO3 films grown in different background conditions where the best structural properties coincide with the largest amount of negative plasma species. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3660399]

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