High-energy focusing Laue method: Recent developments

An original set-up dedicated to the focusing Laue method at high allergy (100-400 keV) was installed at the Institut Laue Langevin. Three beam lines are available with three different characteristics and resolutions. After the description of the apparatus, the obtained performances will be given. Through examples taken from perfect anti imperfect crystals, the type of information got during the study or the characterisation of single crystals will he presented, specially the possibility to localise the defects by mean of topographic measurements will be emphasised. At last the capabilities of this type of apparatus for bulk measurements of the texture of polycrystalline materials will be shown.