Infrared evidence for Hoffman reaction during calcination of surfactant-templated silica films and analysis of the resulting surface sites

被引：8

作者：

Berquier, JM ^{[1
]}

Nael, P ^{[1
]}

Jupille, J ^{[1
]}

Jacquiod, C ^{[1
]}

机构：

[1] CNRS St Gobain, F-93303 Aubervilliers, France

来源：

JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY | 2000年 / 19卷 / 1-3期

关键词：

mesoporous materials; thin film; infrared spectroscopy;

D O I：

10.1023/A:1008766322651

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Fourier Transform Infrared transmission spectroscopy is used to characterize surfactant-templated silica films on glass. The calcination process is followed in situ and evidence for the removal of the surfactant along the Hoffman reaction is given. Once calcined, the surface of the pores of the mesoporous films is proven by deuteration experiment to be hydroxylated. Bands are attributed to isolated and hydrogen-bonded silanols. Silylation reaction with hexamethyldisilazane only occurs with isolated silanol groups.

引用

页码：83 / 87

页数：5

共 17 条

[1] Synthesis of transparent mesoporous and mesostructured thin silica films [J].