Hole drift mobility in μc-Si:H

被引:42
作者
Juska, G
Viliunas, M
Arlauskas, K
Nekrasas, N
Wyrsch, N
Feitknecht, L
机构
[1] Vilnius State Univ, Dept Solid State Elect, LT-2040 Vilnius, Lithuania
[2] Univ Neuchatel, Inst Microtech, CH-2000 Neuchatel, Switzerland
关键词
D O I
10.1063/1.1359436
中图分类号
O59 [应用物理学];
学科分类号
摘要
In microcrystalline hydrogenated silicon (muc-Si:H), the drift mobility dependencies of holes on electric field and temperature have been measured by using a method of equilibrium charge extraction by linearly increasing voltage. At room temperature the estimated value of the drift mobility of holes is much lower than in crystalline silicon and slightly higher than in amorphous hydrogenated silicon (a-Si:H). In the case of stochastic transport of charge carriers with energetically distributed localized states, the numerical model of this method gives insight into the mobility dependence on electric field. From the numerical modeling and experimental measurement results, it follows that the hole drift mobility dependence on electric field is predetermined by electric field stimulated release from localized states. (C) 2001 American Institute of Physics.
引用
收藏
页码:4971 / 4974
页数:4
相关论文
共 4 条
[1]   Extraction current transients: New method of study of charge transport in microcrystalline silicon [J].
Juska, G ;
Arlauskas, K ;
Viliunas, M ;
Kocka, J .
PHYSICAL REVIEW LETTERS, 2000, 84 (21) :4946-4949
[2]   New method of drift mobility evaluation in μc-Si:H, basic idea and comparison with time-of-flight [J].
Juska, G ;
Genevicius, K ;
Viliunas, M ;
Arlauskas, K ;
Stuchlíková, H ;
Fejfar, A ;
Kocka, J .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 2000, 266 :331-335
[3]  
MOTT NF, 1979, ELECT PROCESSES NONC, V2, P664
[4]   Intrinsic microcrystalline silicon (μc-Si:H) deposited by VHF-GD (very high frequency-glow discharge):: a new material for photovoltaics and optoelectronics [J].
Shah, A ;
Vallat-Sauvain, E ;
Torres, P ;
Meier, J ;
Kroll, U ;
Hof, C ;
Droz, C ;
Goerlitzer, M ;
Wyrsch, N ;
Vanecek, M .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2000, 69 :219-226