Phase change of sputtered LaNi5 thin films due to hydrogenation

被引:11
作者
Huang, L [1 ]
Gong, H
Gao, W
机构
[1] Natl Univ Singapore, Dept Mat Sci, Singapore 119260, Singapore
[2] Univ Sci & Technol China, Dept Mat Sci & Engn, Hefei 230026, Anhui, Peoples R China
[3] Univ Auckland, Sch Engn, Dept Chem & Mat Engn, Auckland, New Zealand
关键词
phase transitions; sputtering; surface segregation; X-ray diffraction;
D O I
10.1016/S0040-6090(98)01068-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Polycrystalline LaNi5 thin films were prepared by a co-sputtering method. Structural changes of the films after the hydrogen absorption-desorption cycles at different temperatures and after the heat treatment in a hydrogen atmosphere were investigated by X-ray diffraction (XRD) analysis. At room temperature, the sputtered films have much longer cyclic stability; however, the increase of temperature during hydriding-dehydriding process, and the hydrogen heat treatment at elevated temperatures speed up the disproportionation reaction or the segregation of the LaNi5 alloy thin film. A comparison of the results of the sputtered LaNi5 thin him with the previously reported data of the evaporated LaNi5 thin film shows a significant improvement of the him stability. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:78 / 81
页数:4
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