Quantitative structure determination of an NHx species adsorbed on Cu(110)

被引：33

作者：

Hirschmugl, CJ

Schindler, KM

Schaff, O

Fernandez, V

Theobald, A

Hofmann, P

Bradshaw, AM

Davis, R

Booth, NA

Woodruff, DP

Fritzsche, V

机构：

[1] UNIV WARWICK,DEPT PHYS,COVENTRY CV4 7A,W MIDLANDS,ENGLAND

[2] TECH UNIV DRESDEN,INST THEORET PHYS,D-08927 DRESDEN,GERMANY

来源：

SURFACE SCIENCE | 1996年 / 352卷

基金：

英国工程与自然科学研究理事会;

关键词：

ammonia; chemisorption; copper; photoelectron diffraction; single crystal surfaces; surface structure;

D O I：

10.1016/0039-6028(95)01139-0

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Using scanned energy mode photoelectron diffraction we have recently investigated the local structure of NH3 and NHx (x = 1 or 2) on Cu(110). NH3 was found to occupy the atop site on the closed-packed Cu rows in the first layer. The NHx species, discussed in more detail in the present paper, occupies the short bridge site on the outermost [110] rows, at a height of 1.40 +/- 0.02 Angstrom above the surface, resulting in a Cu-N nearest neighbour distance of 1.89 Angstrom.

引用

页码：232 / 237

页数：6

共 31 条

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