Destruction of volatile organic compounds used in a semiconductor industry by a capillary tube discharge reactor

被引:154
作者
Kohno, H [1 ]
Berezin, AA
Chang, JS
Tamura, M
Yamamoto, T
Shibuya, A
Hondo, S
机构
[1] Asahikogyosha Co Ltd, Ctr Res & Dev, Narashino, Chiba 275, Japan
[2] McMaster Univ, Dept Engn Phys, Hamilton, ON L8S 4L7, Canada
[3] Res Triangle Inst, Ctr Environm Technol, Res Triangle Pk, NC 27709 USA
基金
加拿大自然科学与工程研究理事会;
关键词
aerosols; capillary tube discharge reactors; environmental technology; gas discharge; nonthermal plasma; plasma chemistry; volatile organic compounds;
D O I
10.1109/28.720435
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Nonthermal plasma technologies offer an innovative approach to the problem of decomposing various volatile organic compounds (VOC's). We focused on de capillary tube discharge plasma reactors to study the decomposition/destruction efficiency for toluene, EGM, trichloroethane, and trichlroethylene at 50-2300-ppm levels in dry air. The effects of gas flow rate, VOC concentration, and reactor operating conditions on decomposition and analysis of reactant conversion for each VOC were investigated, The results show that VOC destruction efficiency as high as 90% can be achieved, even under a short residence time (3.8 ms),vith a destruction energy efficiency of up to 95 g (VOC)/kWh. Laboratory-scale plasma technology was successfully demonstrated for its potential application for VOC control in the semiconductor clean-room environment.
引用
收藏
页码:953 / 966
页数:14
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