Metallic Cu coating on HTS surfaces using electrochemical preparation

被引:17
作者
Floegel-Delor, U [1 ]
Rothfeld, R [1 ]
Wippich, D [1 ]
Riedel, T [1 ]
Werfel, F [1 ]
机构
[1] Adelwitz Technologiezentrum GmbH, ATZ, D-04886 Adelwitz, Germany
关键词
Cu deposition; interface structure; HTS bulk; metal contact;
D O I
10.1109/77.919653
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A progress in the Cu/HTS connection at an industrial - like and economical level has been achieved. We report a successful electrochemical deposition method of medium- scale fabrication of 0.5 - 50 mum thin homogeneous Cu films on HTS surfaces. The microstructure of the layer and the interface properties are characterized by SEM and analytical investigations. We measure contact resistivities of Cu on bulk YBCO in the 0.3 mu Omega cm(2) range at 77 K and evaluate it with data from microscopy analysis. The fabrication method allows the Cu deposition on all Cu-O - based HTS materials. Cu prevents HTS long - time degradation and surface corrosion. The metallic layer is capable of improving the electrical and thermal properties of HTS components to withstand shock, hot spots and short circuit-currents in electrical systems, e,g, current leads and fault current limiters.
引用
收藏
页码:2838 / 2841
页数:4
相关论文
共 4 条
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