Ion etching of fused silica glasses for high-power lasers

被引：23

作者：

Kamimura, T

Mori, Y

Sasaki, T

Yoshida, H

Okamoto, T

Yoshida, K

机构：

[1] Osaka Univ, Dept Elect Engn, Suita, Osaka 5650871, Japan

[2] Osaka Univ, Inst Laser Engn, Suita, Osaka 5650871, Japan

[3] Okamoto Opt Work Inc, Isogo Ku, Yokohama, Kanagawa 2350008, Japan

[4] Osaka Inst Technol, Dept Elect Engn, Asahi Ku, Osaka 5358585, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1998年 / 37卷 / 9A期

关键词：

ion etching; subsurface fissure; surface roughness; laser-induced surface damage;

D O I：

10.1143/JJAP.37.4840

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Subsurface damage incurred during optical polishing, which is known to lower the laser damage thresholds of fused silica surfaces, Ras studied. Ceria in subsurface fissures was completely removed (depths up to one thousand Angstrom) using rf-magnetron sputtering without degrading surface roughness. The laser-induced damage threshold of the optical coating deposited on an ion-etched surface was improved by a factor of two compared to that on an unprocessed surface.

引用

页码：4840 / 4841

页数：2

共 6 条

[1] ROLE OF CRACKS, PORES, AND ABSORBING INCLUSIONS ON LASER-INDUCED DAMAGE THRESHOLD AT SURFACES OF TRANSPARENT DIELECTRICS [J].