On-wafer measurements of nonlinear effects in high temperature superconductors

被引:10
作者
Booth, JC [1 ]
Vale, LR [1 ]
Ono, RH [1 ]
机构
[1] Natl Inst Stand & Technol, Boulder, CO 80305 USA
关键词
high-temperature superconductors; microwave devices; nonlinear response;
D O I
10.1109/77.919610
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present the results of comprehensive on-wafer microwave probe station measurements of the nonlinear properties of coplanar waveguide devices patterned from high-temperature superconductor (HTS) thin films. We introduce a sequence of measurements and analysis that is designed to describe the nonlinear response of microwave devices in increasingly general terms, and that verifies the resulting description with a number of different nonlinear measurements of different patterned devices. We demonstrate the use of this methodology to analyze the nonlinear response of YBa2CU3O7-8 (YBCO) thin films at 76 K, and find that all of our measurements can be satisfactorily explained by a current-dependent penetration depth of the form lambda=lambda (0)[l+(J/J(0))(2)]. The parameter J(0) is a current-density scale that describes the strength of the material nonlinearity, and can be used as a suitable parameter for optimizing film growth techniques.
引用
收藏
页码:1387 / 1391
页数:5
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