Magnetic domain patterns of rectangular and elliptic arrays of small permalloy elements

被引:31
作者
Liou, SH [1 ]
Sabiryanov, RF
Jaswal, SS
Wu, JC
Yao, YD
机构
[1] Univ Nebraska, Dept Phys & Astron, Lincoln, NE 68588 USA
[2] Univ Nebraska, Ctr Mat Res & Anal, Lincoln, NE 68588 USA
[3] Changhua Univ Educ, Dept Phys, Changhua, Taiwan
[4] Acad Sinica, Inst Phys, Taipei 115, Taiwan
基金
美国国家科学基金会;
关键词
domain structure; magnetic force microscopy; micromagnetic calculation; permalloy;
D O I
10.1016/S0304-8853(01)00073-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Magnetic domain patterns of two series of soft magnetic arrays are studied as functions of the aspect ratios. The magnetic images are obtained by using MFM with low magnetic stray field and high-coercivity MFM tips. A 30 nm thick layer of Ni80Fe20 alloy is prepared by thermal evaporation and electron beam lithography and lift-off patterning technique on a silicon substrate. The effect of the edge roughness and initial conditions on the magnetic domain patterns is compared with the results obtained by micromagnetic simulations. This comparison clearly shows that the domain structure is related to the edge roughness. (C) 2001 Published by Elsevier Science B.V.
引用
收藏
页码:1270 / 1272
页数:3
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