Preparation of thick functionally graded layers of ceramics by surface modification of tantalum and titanium using high temperature plasma processing

被引:4
作者
Nunogaki, M [1 ]
Inoue, M [1 ]
Kitahama, K [1 ]
机构
[1] Osaka Univ, Inst Sci & Ind Res, Osaka 5670047, Japan
关键词
metal ceramics; tantalum carbide; tantalum nitride; titanium carbide; functionally graded materials; plasma processing;
D O I
10.2320/matertrans.42.457
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Surfaces of metals, such as Ta acid Ti, have been changed successfully to a new type of ceramic layers having the compositional gradient by means of the plasma processing at high temperature above 900 degreesC. Surfacer of Ta and Ti were transformed to thick layers of ceramics, i.e. TiC, TiN, TaC or TaN components, respectively, by carburizing or nitriding. Resultantly, a Vicker's hardness of each modified sample surface remarkably increased over 3000 kg/mm(2) The density of carbides or nitrides in the modified layer and at the interface was measured to decrease with depth. The width of interface was wide about 7 mum, in the case of TiC. Additionally, the irradiation of 20 MeV-electron beam to samples as the pretreatment before the plasma processing was effective to increase the thickness of modified layer.
引用
收藏
页码:457 / 459
页数:3
相关论文
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