Interaction of evaporated nickel nanoparticles with highly oriented pyrolytic graphite: Back-bonding to surface defects, as studied by x-ray photoelectron spectroscopy

被引:39
作者
Yang, DQ [1 ]
Sacher, E [1 ]
机构
[1] Ecole Polytech, Dept Genie Phys, Regroupement Quebecois Mat Pointe, Montreal, PQ H3C 3A7, Canada
关键词
D O I
10.1021/jp0536504
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Ni nanoparticle evaporation onto highly oriented pyrolytic graphite (HOPG), with low and high surface defect densities, has been studied in situ by X-ray photoelectron spectroscopic (XPS) techniques, including binding energy shifts, Auger parameters, and Wagner plots. Ni nucleates at defect sites, whether initially present or those introduced by Ar+ bombardment, with the formation of spherical nanoparticles, which adhere strongly through Ni/HOPG back-bonding. The variation of the C Is peak intensity with Ni coverage suggests that the photoelectron emission yield may be enhanced at lower Ni coverages, due to Ni nanoparticle-induced electron localization and work function reduction at the HOPG surface, which is evidence of such back-bonding.
引用
收藏
页码:19329 / 19334
页数:6
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