Xenon excimer emission from pulsed microhollow cathode discharges

被引：49

作者：

Moselhy, M ^{[1
]}

Shi, W ^{[1
]}

Stark, RH ^{[1
]}

Schoenbach, KH ^{[1
]}

机构：

[1] Old Dominion Univ, Dept Elect & Comp Engn, Phys Elect Res Inst, Norfolk, VA 23529 USA

来源：

APPLIED PHYSICS LETTERS | 2001年 / 79卷 / 09期

关键词：

D O I：

10.1063/1.1397760

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

By applying electrical pulses of 20 ns duration to xenon microplasmas, generated by direct current microhollow cathode discharges, we were able to increase the xenon excimer emission by more than an order of magnitude over direct current discharge excimer emission. For pulsed voltages in excess of 500 V, the optical power at 172 nm was found to increase exponentially with voltage. Largest values obtained were 2.75 W of vacuum-ultraviolet optical power emitted from a single microhollow cathode discharge in 400 Torr xenon with a 750 V pulse applied to a discharge. Highest radiative emittance was 15.2 W/cm(2). The efficiency for excimer emission was found to increase linearly with pulsed voltages above 500 V reaching values of 20% at 750 V. (C) 2001 American Institute of Physics.

引用

页码：1240 / 1242

页数：3

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