Characterisation of carbon nitride thin films prepared by reactive magnetron sputtering

被引：9

作者：

Fernandez, A ^{[1
]}

Sanchez-Lopez, JC ^{[1
]}

Lassaletta, G ^{[1
]}

机构：

[1] Inst Ciencia Mat Sevilla, Ctr Invest Cient Isla Cartuja, Seville, Spain

来源：

CARBON | 1998年 / 36卷 / 5-6期

关键词：

carbon composites; infrared spectroscopy; transmission electron microscopy (TEM); electron energy loss spectroscopy (EELS); X-ray photoelectron spectroscopy (XPS);

D O I：

10.1016/S0008-6223(98)00074-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Carbon nitride (CN,) thin films have been obtained by reactive magnetron sputtering in a pure N-2 discharge. The films have been characterised by Fourier transform infrared spectroscopy (IR), transmission electron microscopy (TEM), electron energy loss spectroscopy(EELS), X-ray photoelectron spectroscopy (XPS) and UV-vis absorption spectroscopy. A maximum value of N/C=0.5 has been achieved. Evidence is presented of the formation of a polymer-like CN, amorphous phase which contains C=N, C=N and C-N bonds. A new peak at 286.5 eV energy loss in the C K-edge EELS spectra has been assigned to C=N bonds with carbon in the sp(2) hybridisation state. Infrared spectroscopy indicates that cyanogen-like groups are present in the films and can be partially removed by thermal annealing. The contribution of C-N and C=N bonds has also been determined by infrared and XPS spectroscopy. (C) 1998 Elsevier Science Ltd. All rights reserved.

引用

页码：761 / 764

页数：4

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