Unsharp Masking Sharpening Detection via Overshoot Artifacts Analysis

被引:95
作者
Cao, Gang [1 ,2 ]
Zhao, Yao [1 ,2 ]
Ni, Rongrong [1 ,2 ]
Kot, Alex C. [3 ]
机构
[1] Beijing Jiaotong Univ, Inst Informat Sci, Beijing, Peoples R China
[2] Beijing Key Lab Adv Informat Sci & Network Techno, Beijing 100044, Peoples R China
[3] Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore, Singapore
基金
美国国家科学基金会;
关键词
Digital forensics; image sharpening; overshoot artifacts; unsharp masking; EXPOSING DIGITAL FORGERIES; IMAGE-ENHANCEMENT;
D O I
10.1109/LSP.2011.2164791
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
080906 [电磁信息功能材料与结构]; 082806 [农业信息与电气工程];
摘要
In this letter, we propose a new method in detecting unsharp masking (USM) sharpening operation in digital images. Overshoot artifacts are found to occur around side-planar edges in the sharpened images. Such artifacts, measured by a sharpening detector, can serve as a rather unique feature for identifying the previous performance of sharpening operation. Test results on photograph images with regard to various sharpening operators show the effectiveness of our proposed method.
引用
收藏
页码:603 / 606
页数:4
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