Texture-etched zinc oxide substrates for silicon thin film solar cells -: from laboratory size to large areas

被引:5
作者
Müller, J [1 ]
Schöpe, G [1 ]
Kluth, O [1 ]
Rech, B [1 ]
Ruske, M [1 ]
Trube, J [1 ]
Szyszka, B [1 ]
Höing, T [1 ]
Jiang, X [1 ]
Bräuer, G [1 ]
机构
[1] Forschungszentrum Julich, Inst Photovolta, D-52425 Julich, Germany
来源
CONFERENCE RECORD OF THE TWENTY-EIGHTH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE - 2000 | 2000年
关键词
D O I
10.1109/PVSC.2000.915994
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Large area glass/ZnO-films were prepared by either dc-magnetron sputtering from ceramic targets or mf-sputtering from metallic targets and compared to small area laboratory-type rf-sputtered ZnO. The initially smooth films exhibit excellent electrical (resistivity = 4-9 . 10(.4) Omega cm) and optical (average transmission >80% for visible light) properties and develop a surface texture upon etching in diluted hydrochloric acid. Independent of sputter technique (dc or rf) and substrate size, higher substrate temperatures and lower sputter gas pressures have a similar influence on the film structure and lead to more robust and etch-resistant films. Showing excellent light scattering properties, amorphous silicon p-i-n solar cells prepared on these large area glass/ZnO samples exhibit initial efficiencies up to 9.2% proving the applicability of sputtered and texture-etched ZnO as TCO-substrate for industrial solar module production.
引用
收藏
页码:758 / 761
页数:4
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