The VLT-VIRMOS mask manufacturing unit

被引：10

作者：

Conti, G

Mattaini, E

Chiappetti, L

Maccagni, D

Sant'Ambrogio, E

Bottini, D

Garilli, B

Le Fèvre, O

Saisse, M

Voët, C

Caputi, O

Cascone, E

Mancini, D

Mancini, G

Perrotta, F

Schipani, P

Vettolani, G

机构：

[1] CNR, Ist Fis Cosm G Occhialini, I-20133 Milan, Italy

[2] Lab Astrophys Marseille, Traverse Siphon, F-13376 Marseille, France

[3] Osservatorio Astron Capodimonte, I-80131 Naples, Italy

[4] CNR, Ist Radioastron, I-40129 Bologna, Italy

来源：

PUBLICATIONS OF THE ASTRONOMICAL SOCIETY OF THE PACIFIC | 2001年 / 113卷 / 782期

关键词：

D O I：

10.1086/319548

中图分类号：

P1 [天文学];

学科分类号：

0704 ;

摘要：

The VIRMOS Consortium had the task to design and manufacture two spectrographs for the ESO Very Large Telescope, VIMOS (Visible Multi-Object Spectrograph) and NIRMOS (Near Infrared Multi-Object Spectrograph). This paper describes how the mask manufacturing unit (MMU), which cuts the slit masks to be used with both instruments, meets the scientific requirements and manages the storage and the insertion of the masks into the instrument. The components and the software of the two main parts of the MMU, the mask manufacturing machine and the mask handling system, are illustrated together with the mask material and with the slit properties. Slit positioning is accurate within 15 mum, equivalent to 0."03 on the sky, while the slit edge roughness has an rms on the order of 0.03 pixels on scales of a slit 5" long and of 0.01 pixels on the pixel scale (0."205). The MMU was successfully installed during 2000 July/August at the Paranal Observatory and is now operational for spectroscopic mask cutting, in compliance with the requested specifications.

引用

页码：452 / 462

页数：11

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