Microstructural study of iron nitride thin films deposited by ion beam sputtering

被引：18

作者：

Gupta, M ^{[1
]}

Gupta, A ^{[1
]}

Chaudhari, SM ^{[1
]}

Phase, DM ^{[1
]}

Ganesan, V ^{[1
]}

Rao, MVR ^{[1
]}

Shripathi, T ^{[1
]}

Dasannacharya, BA ^{[1
]}

机构：

[1] Inter Univ Consortium DAE Facil, Indore 452017, India

来源：

VACUUM | 2001年 / 60卷 / 04期

关键词：

iron nitride; sputtering; thin film; Mossbauer; nuclear Bragg monochromator;

D O I：

10.1016/S0042-207X(00)00148-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

An amorphous iron nitride thin film was deposited using reactive ion beam sputtering of iron by a beam of argon and nitrogen ions. Nitrogen content in the film as determined from conversion electron Mossbauer spectroscopy (CEMS) and X-ray photoelectron spectroscopy (XPS) was FeN0.7. The mass density of the film was calculated using energy-dispersive X-ray reflectivity (EDXRR) measurements and is found to be 6.0 gm/cm(3). GEMS shows that the film is nonmagnetic in nature. Morphology of the film is obtained From atomic force microscopy (AFM). The surface roughness of the film does not increase appreciably beyond that of the substrate even after a deposition of 131 nm of material with these qualities the film is a good candidate for the multilayer superstructure of a nuclear Bragg monochromator of the type (FeN0.7)-Fe-56/(FeN0.7)-Fe-57. (C) 2001 Elsevier Science Ltd. All rights reserved.

引用

页码：395 / 399

页数：5

共 12 条

[1] TIME-RESOLVED NUCLEAR RESONANT SCATTERING FROM SN-119 NUCLEI USING SYNCHROTRON RADIATION [J].