Photoemission and x-ray-absorption study of boron carbide and its surface thermal stability

被引：137

作者：

Jimenez, I

Sutherland, DGJ

van Buuren, T

Carlisle, JA

Terminello, LJ

Himpsel, FJ

机构：

[1] Lawrence Livermore Natl Lab, Livermore, CA 94551 USA

[2] Univ Wisconsin, Dept Phys, Madison, WI 53706 USA

来源：

PHYSICAL REVIEW B | 1998年 / 57卷 / 20期

关键词：

D O I：

10.1103/PhysRevB.57.13167

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We present a photoemission and x-ray-absorption study on boron carbide which identifies the spectroscopic features of this material, discussing them in connection with current structural models. A study on the surface thermal stability is also performed, revealing that despite the high melting point of boron carbide (similar to 2600 K), significant surface modifications occur in the material at about 1800 K. At this temperature the surface becomes covered with a graphite layer formed from bulk segregation of carbon, leaving boron-rich boron carbide buried beneath the graphitic surface.

引用

页码：13167 / 13174

页数：8

共 45 条

[1]

ASELAGE TL, 1991, AIP CONF PROC, V231, P177, DOI 10.1063/1.40890

[2] The crystal structure of boron carbide [J].