Strong dependence of the Fe thin-film magnetic anisotropy on the Si(111) substrate preparation

被引:9
作者
dos Santos, MC
Geshev, J
Silva, DK
Schmidt, JE
Pereira, LG
Hubler, R
Allongue, P
机构
[1] Univ Fed Rio Grande do Sul, Inst Fis, BR-91501970 Porto Alegre, RS, Brazil
[2] PUC, BR-90619900 Porto Alegre, RS, Brazil
[3] Univ Paris 06, Lab Phys Liquides & Electrochim, CNRS, UPR 15, F-75005 Paris, France
关键词
D O I
10.1063/1.1588363
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on the influence of the Si(111) surface preparation on both the structural and the magnetic properties of iron thin films grown onto them. Two different substrate preparation procedures were used, in one of which the substrate was purposely oxidized. The. surface analysis was performed by using atomic force and scanning tunneling microscopies, and the magnetic behavior of the films was observed by magneto-optic Kerr effect polarimetry. A strong relationship between the substrate preparation procedure, morphology, and the magnetic response of the iron films was found. A phenomenological model was used to interpret the experimental magnetization data and to derive the anisotropy parameters for both types of Fe samples. It was found that the magnetic response of the film grown onto the oxidized substrate is dominated by the uniaxial anisotropy originated from the substrate topology (a terracelike structure); the behavior of the other film, grown onto the unoxidized substrate, is determined by both cubic and easy-plane anisotropies. (C) 2003 American Institute of Physics.
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页码:1490 / 1494
页数:5
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