Preparation and characterization of sputtered Fe1-xNx films

被引:23
作者
Easton, EB
Buhrmester, T
Dahn, JR [1 ]
机构
[1] Dalhousie Univ, Dept Phys, Halifax, NS B3H 3J5, Canada
[2] Dalhousie Univ, Dept Chem, Halifax, NS B3H 3J5, Canada
基金
加拿大自然科学与工程研究理事会;
关键词
iron nitride; sputtered films; reactive sputtering; nitrides;
D O I
10.1016/j.tsf.2005.06.063
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Iron nitride films have been prepared by reactive DC magnetron sputtering. The composition of Fe1-xNx was varied over a range of 0 < x < 0.5 by controlling the nitrogen flow rate during sputtering. These films were characterized using powder X-ray diffraction (XRD), thermogravimetric and electron microprobe analysis. We found that the nitrogen content in the films increased with nitrogen gas partial pressure. XRD experiments revealed an evolution through the alpha-Fe, y '-Fe4N, epsilon-Fe2+zN, xi-Fe2N, y '''-FeN and -y ''-FeN phases, when the nitrogen gas mole percentage was increased from 0% up to 70%. Above 70%, only the y '''-FeN phase was formed despite a measurable increase in the nitrogen content of the film with nitrogen gas partial pressure. Rietveld analysis of powder X-ray diffraction patterns revealed that this behavior is due to an increase in the nitrogen site occupation factor within the lattice. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:60 / 66
页数:7
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