Anisotropy and non-universality in kinetic roughening

被引：9

作者：

Cafiero, R

Loreto, V

Prosini, PP

机构：

[1] Max Planck Inst Phys Complex Syst, D-01187 Dresden, Germany

[2] Ecole Super Phys & Chim Ind, PMMH, F-75231 Paris 05, France

[3] ENEA, Res Ctr Local Granatello, I-80055 Napoli, Italy

来源：

EUROPHYSICS LETTERS | 1998年 / 42卷 / 04期

关键词：

D O I：

10.1209/epl/i1998-00260-6

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

We introduce a new model for kinetic roughening which exhibits a non-universal behavior for the roughness exponent, in agreement with many experimental findings. The model, inspired by the chemical etching processes, takes explicitly into account the effect of anisotropy, say the dependence of the growth rule on the local environment conditions. The interplay between anisotropy and non-universality is investigated as well as the relationship with the known universality classes.

引用

收藏

页码：389 / 394

页数：6

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