Optical constants of DC magnetron sputtered titanium dioxide thin films measured by spectroscopic ellipsometry

被引:58
作者
Karunagaran, B
Kumar, RTR
Viswanathan, C
Mangalaraj, D [1 ]
Narayandass, SK
Rao, GM
机构
[1] Bharathiar Univ, Dept Phys, Thin Film Lab, Coimbatore 641046, Tamil Nadu, India
[2] Indian Inst Sci, Vacuum & Thin Film Lab, Dept Instrumentat, Bangalore 560012, Karnataka, India
关键词
TiO2 thin films; spectroscopic ellipsometry; optical constants; DC magnetron sputtering;
D O I
10.1002/crat.200310094
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Optical constants of DC magnetron sputtered TiO2 thin film have been determined by Spectroscopic Ellipsometry in the photon energy range 1.2 to 5.5 eV at room temperature. The measured dielectric-function spectra reveal distinct structures at energies of the E1, E1+Delta1 and E2 critical points are due to interband transitions. The root mean square roughness of the magnetron sputtered TiO2 thin films evaluated by ex-situ atomic force microscopy is 5.8 nm. The Dielectric constant values were found to be substantially lower than those for the bulk TiO2. The dielectric related Optical constants, such as the refractive index, extinction coefficient, absorption coefficient and normal incidence of reflectivity determined from the spectroscopic ellipsometry data are presented and analyzed. The optical constants of the films were also determined using the optical transmittance measurements and the results were discussed.
引用
收藏
页码:773 / 778
页数:6
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