Thermal plasma deposition of nanostructured films

被引：8

作者：

Neuman, A

Blum, J

Tymiak, N

Wong, Z

Rao, NP

Gerberich, W

McMurry, PH

Heberlein, JVR

Girshick, SL

机构：

[1] Univ Minnesota, Dept Mech Engn, Minneapolis, MN 55455 USA

[2] Univ Minnesota, Dept Chem Engn & Mat Sci, Minneapolis, MN 55455 USA

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 1999年 / 27卷 / 01期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1109/27.763025

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

A thermal plasma process for the synthesis of nanoparticles and their immediate assembly into nanostructured films is discussed. In this process, known as hypersonic plasma particle deposition, a thermal plasma with injected precursors is expanded through a nozzle to nucleate nanoparticles, which are then inertially deposited onto a cooled substrate in vacuum. A lightly consolidated nanostructured film results. Particle and film diagnostics along with images of the plasma flow are used to explain the formation of nanostructured silicon carbide films by this process.

引用

页码：46 / 47

页数：2