A study of the influence of typical wet chemical treatments on the germanium wafer surface

被引：70

作者：

Onsia, B

Conard, T

De Gendt, S

Heyns, M

Hoflijk, I

Mertens, P

Meuris, M

Raskin, G

Sioncke, S

Teerlinck, I

Theuwis, A

Van Steenbergen, J

Vinckier, C

机构：

[1] IMEC, B-3001 Heverlee, Belgium

[2] Katholieke Univ Leuven, Afd Fys Anal Chem, B-3001 Heverlee, Belgium

[3] Umicore, B-2250 Olen, Belgium

来源：

ULTRA CLEAN PROCESSING OF SILICON SURFACES VII | 2005年 / 103-104卷

关键词：

germanium; oxidation; etching; rinsing; stability;

D O I：

10.4028/www.scientific.net/SSP.103-104.27

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：27 / 30

页数：4

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