Oriented growth of ZnO crystals on self-assembled monolayers of functionalized alkyl silanes

被引:40
作者
Turgeman, R
Gershevitz, O
Palchik, O
Deutsch, M
Ocko, BM
Gedanken, A
Sukenik, CN [1 ]
机构
[1] Bar Ilan Univ, Dept Chem, IL-52900 Ramat Gan, Israel
[2] Bar Ilan Univ, Dept Phys, IL-52900 Ramat Gan, Israel
[3] Brookhaven Natl Lab, Dept Phys, Upton, NY 11973 USA
基金
美国国家科学基金会;
关键词
D O I
10.1021/cg0340953
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Highly ordered ZnO crystals of 0.15 mum width and 0.5 mum length were grown on silicon wafers coated with a monolayer of SiCl3(CH2)(11)-O-C6H5 molecules. Various techniques (contact angle measurements, ellipsometry, ATR-FTIR) were employed for determining the quality of the monolayer coating. In addition, the bare and silane-coated Si wafers were studied by X-ray reflectivity (XR) and grazing-incidence diffraction (GID) using synchrotron radiation. The results obtained point to a possible relationship between the organization of the self-assembled monolayer (SAM) coating, the dipole moment of the headgroup, and the orientation of the ZnO crystals.
引用
收藏
页码:169 / 175
页数:7
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