Spontaneous evolution of silica-supported Ti amide fragments to imine and imido complexes

被引：44

作者：

Beaudoin, M ^{[1
]}

Scott, SL ^{[1
]}

机构：

[1] Univ Ottawa, Dept Chem, Ottawa, ON K1N 6N5, Canada

来源：

ORGANOMETALLICS | 2001年 / 20卷 / 02期

关键词：

D O I：

10.1021/om000915m

中图分类号：

O61 [无机化学];

学科分类号：

070301 ; 081704 ;

摘要：

Upon prolonged exposure to vacuum (drop SiO)(2)Ti(N(CH2R)(2) (R = H, (1), Me (2)) evolves to an N-methylmethylenimine complex (3; R = H) or an ethylimido complex: (5; R = Me). The change in, the reaction mechanism depending on the nature of the molecular precursor accounts for the lower level of carbon contamination in TiN films formed from the complex with the higher initial carbon content.

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页码：237 / 239

页数：3

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