Field and temperature-dependent electronic transport parameters of amorphous and polycrystalline GaSe thin films

被引:31
作者
Thamilselvan, M [1 ]
Premnazeer, K [1 ]
Mangalaraj, D [1 ]
Narayandass, SK [1 ]
机构
[1] Bharathiar Univ, Dept Phys, Thin Film Lab, Coimbatore 641046, Tamil Nadu, India
关键词
GaSe thin films; DC conductivity; Mott parameters; SCLC; density of states;
D O I
10.1016/S0921-4526(03)00444-7
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
DC electrical conduction studies on vacuum evaporated thin films of GaSe in both the amorphous and polycrystalline states using the Al-GaSe-Al sandwich structure has been performed. Under low electric field (similar to2.2 x 10(5) V cm(-1)) condition, in amorphous films in the temperature range 250-310K and in polycrystalline films in the temperature range 190-250K the variable-range hopping conduction of Mott's type is identified. For the same field, the Seto's model of thermionic emission for polycrystalline film (280-370K) perfectly suits. The amorphous and polycrystalline GaSe thin films have localized states density values of N(E-F) = 1.686 x 10(17) and 1.257 x 10(15) Cm-3 eV(-1), respectively. The activation energies are found to be 0.317 and 0.087eV, respectively for these two forms of material. The analysis of I-V characteristics, based on space charge limited currents measurements, confirms the exponential decrease of density of states from the conduction band edge towards the Fermi level for both the amorphous and polycrystalline films. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:404 / 412
页数:9
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