Probing interfacial and bulk magnetic hysteresis in roughened CoFe thin films

被引：29

作者：

Freeland, JW ^{[1
]}

Bussmann, K

Lubitz, P

Idzerda, YU

Cao, CC

机构：

[1] USN, Res Lab, Washington, DC 20375 USA

[2] Brookhaven Natl Lab, NSLS, Upton, NY 11973 USA

[3] Brookhaven Natl Lab, Naval Res Lab, Upton, NY 11973 USA

来源：

APPLIED PHYSICS LETTERS | 1998年 / 73卷 / 15期

关键词：

D O I：

10.1063/1.122424

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The hysteretic behavior of interfacial magnetic moments for CoFe thin films with varying roughness is determined in an element specific manner by monitoring the applied magnetic field dependence of the specular and off-specular (diffuse) contributions to the x-ray resonant magnetic scattering signal. Increasing the interfacial roughness generates a larger variation of the relative coercive field associated with the interfacial moment in comparison to the bulk. (C) 1998 American Institute of Physics. [S0003-6951(98)00941-3].

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页码：2206 / 2208

页数：3

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