Scattering from normal incidence EUV optics

被引：27

作者：

Gullikson, EM ^{[1
]}

机构：

[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Ctr Xray Opt, Berkeley, CA 94720 USA

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES II | 1998年 / 3331卷

关键词：

scattering; EUV lithography; optical testing; roughness; surface profile;

D O I：

10.1117/12.309625

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Measurements of nonspecular EUV scattering from Mo/Si multilayer coated mirrors have been performed. The surface power spectral density (PSD) is deduced from the angular scattering distribution and in ail cases is found to be in excellent agreement with surface profile measurements, by both optical and atomic force microscopy. It is demonstrated that the effects of scatter on the EUV imaging performance of a single normal incidence optic are accurately predicted from surface profile measurements.

引用

页码：72 / 80

页数：9