Influence of helium-ion bombardment on the surface properties of pure and ammonia-adsorbed water thin films

被引：8

作者：

Kondo, M

Shibata, T

Kawanowa, H

Gotoh, Y

Souda, R

机构：

[1] Natl Inst Mat Sci, Adv Mat Lab, Tsukuba, Ibaraki 3050044, Japan

[2] Sci Univ Tokyo, Dept Mat Sci & Technol, Noda, Chiba 2788510, Japan

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2005年 / 232卷

关键词：

water; ammonia; H/D exchange; sputtering; time-of-flight secondary ion mass spectrometry;

D O I：

10.1016/j.nimb.2005.03.036

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The influence of the ion bombardment on the surface properties of water-ice films has been investigated. The films are irradiated with 1.5 keV He+ ions and analyzed sequentially on the basis of time-of-flight secondary-ion mass spectrometry (TOF-SIMS). In order to minimize any temperature-induced effects, the measurements were made at 15 K. The damage of the films, as estimated from the H/D exchange between NH3 and the D2O ice and the intermixing of NH3 with the (H2O)-O-18 ice, is recognized at the fluence above 2 x 10(14) ions/cm(2). The sputtering yield of the D2O ice is determined as 0.9 +/- 0.2 molecules per incoming He+ ion. The temperature-programmed TOF-SIMS analysis of the water-ice films has been completed within the fluence of 5.8 x 10(12) ions/cm(2), so that no appreciable damage of the film should be induced during the measurement. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：140 / 145

页数：6

共 15 条

[1] Sputtering of water ice [J].