Directional-hemispherical reflectance for Spectralon by integration of its bidirectional reflectance

被引:21
作者
Haner, DA [1 ]
McGuckin, BT
Menzies, RT
Bruegge, CJ
Duval, V
机构
[1] Calif State Polytech Univ Pomona, Dept Chem, Pomona, CA 91768 USA
[2] Edinburgh Instruments, Edinburgh, Midlothian, Scotland
[3] CALTECH, Jet Prop Lab, Pasadena, CA 91109 USA
来源
APPLIED OPTICS | 1998年 / 37卷 / 18期
关键词
D O I
10.1364/AO.37.003996
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The directional-hemispherical reflectance is obtained for Spectralon, the material chosen for onboard radiometric calibration of the multiangle imaging spectroradiometer, at laser wavelengths of 442, 632.8, and 859.9 nm. With p-and s-polarized incident light and for an angle of incidence of 45 degrees, the bidirectional reflectance distribution function was measured over a polar angle range of 1-85 degrees and a range of azimuthal angles of 0-180 degrees in 10 degrees increments. The resultant directional-hemispherical reflectance is found by integration to be 1.00 +/- 0.01 at 442 nm, 0.953 +/- 0.01 at 632.8 nn, and 0.956 +/- 0.01 at 859.9 nm. The experimental methodology and the data analysis are presented together with a full discussion of the primary experimental errors. (C) 1998 Optical Society of America.
引用
收藏
页码:3996 / 3999
页数:4
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