Large positive magnetoresistance in Cr/Ag/Cr trilayers

被引:21
作者
Verbanck, G
Temst, K
Mae, K
Schad, R
VanBael, MJ
Moshchalkov, VV
Bruynseraede, Y
机构
[1] Lab. V. Vaste-Stoffysica en Magnet., Katholieke Universiteit Leuven
[2] Research Institute for Materials, K. U. Nijmegen, Toernooiveld
关键词
D O I
10.1063/1.118567
中图分类号
O59 [应用物理学];
学科分类号
摘要
Large positive magnetoresistance (LPMR) effects have been measured at temperatures T < 100 K in epitaxial Cr/Ag/Cr trilayers grown by molecular beam epitaxy. Compared to single Ag films, the magnetoresistance at 4.2 K is enhanced by nearly two orders of magnitude reaching values up to 120% in a field of 8 Tesla. This behavior is related to a drastic modification of the electron scattering at the Ag interfaces due to the presence of the buffer and cap Cr layers. The LPMR curves measured at different temperatures demonstrate a scaling behavior typical for electron transport in two-dimensional systems. The magnitude of the LPMR is a function of temperature and residual resistance ratio and is influenced by the direction of the applied magnetic field. (C) 1997 American Institute of Physics.
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页码:1477 / 1479
页数:3
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