Ion-dust streaming instability in processing plasmas

被引：153

作者：

Rosenberg, M

机构：

[1] Dept. of Elec. and Comp. Engineering, University of California San Diego, San Diego, CA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1996年 / 14卷 / 02期

关键词：

D O I：

10.1116/1.580157

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

An ion-dust streaming instability is investigated for conditions representative of plasma sheath interface regions where dust grains are observed to be present in processing plasmas. Kinetic theory is used, and the effects of collisions of charged particles with neutrals is retained. It is found that an instability with growth rate of the order of the dust plasma frequency may be driven by the drift of ions relative to charged dust. Possible implication for plasma etching is briefly discussed. (C) 1996 American Vacuum Society.

引用

页码：631 / 633

页数：3

共 28 条

[1]

Aleksandrov A.F., 1984, Principles of Plasma Electrodynamics

[2] LABORATORY OBSERVATION OF THE DUST-ACOUSTIC WAVE MODE [J].