Laser plasma x-ray contact microscopy of living specimens using a chemically amplified epoxy resist

被引:20
作者
Cefalas, AC [1 ]
Argitis, P
Kollia, Z
Sarantopoulou, E
Ford, TW
Stead, AD
Marranca, A
Danson, CN
Knott, J
Neely, D
机构
[1] Natl Hellen Res Fdn, Inst Theoret & Phys Chem, GR-11635 Athens, Greece
[2] NCSR Demokritos, Inst Microelect, Ag Paraskevi 15310, Greece
[3] Natl Tech Univ Athens, Dept Phys, GR-15773 Zografos, Athens, Greece
[4] Univ London Royal Holloway & Bedford New Coll, Sch Biol Sci, Egham TW20 0EX, Surrey, England
[5] Rutherford Appleton Lab, Cent Laser Facil, Didcot OX11 0QX, Oxon, England
关键词
D O I
10.1063/1.121616
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on the use of an epoxy based chemically amplified resist, to produce x-ray images of living biological specimens, exposed with laser plasma generated soft x rays, in the water window (2.3-4.4 nm). The photoresist response was at least two orders of magnitude "faster" than polymethyl methacrylate, the standard resist used so far in soft x-ray contact microscopy. Atomic force and scanning electron microscopy of the biological specimen images, recorded in the resist, clearly showed the flagella of the motile green alga, chlamydomonas, suggesting a lateral resolution better than 150 nm. The resist was also capable of providing height features, as small as 20 nm, in atomic force microscope depth profiles and discriminating the flagella intersection areas. (C) 1998 American Institute of Physics. [S0003-6951(98)00225-3].
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页码:3258 / 3260
页数:3
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